发明名称 SUBSTRATE ASSEMBLY FOR STRESSED SYSTEMS
摘要 The invention concerns a structure assembled from a film and a substrate (85, 82) respectively having a first thermal expansion coefficient and a second thermal expansion coefficient which differs from the first, and respectively having first and second assembly faces, motifs being formed in the second substrate (82), said motifs being elastic or being flexible in a plane parallel to the first and second assembly faces.
申请公布号 KR20060034685(A) 申请公布日期 2006.04.24
申请号 KR20067000232 申请日期 2006.01.04
申请人 S.O.I.TEC SILICON ON INSULATOR TECHNOLOGIES 发明人 LETERTRE FABRICE;GHYSELEN BRUNO;RAYSSAC OLIVIER
分类号 H01L21/84;H01L21/20;H01L21/762;H01L21/86 主分类号 H01L21/84
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