| 摘要 |
This invention provides a novel apparatus for producing a photocatalytic material, which, unlike the conventional dry film forming method in which a photocatalytic material is produced by PVD and CVD, can produce a large amount of a high-quality photocatalytic material by a chemical reaction in a light-high-field plasma in a highly concentrated ozone medium state having a very high oxidizing capability, and a method for producing a photocatalytic material. In the method for producing a photocatalytic material and an apparatus for producing a photocatalytic material, a pair of opposed electrodes are provided through a dielectric material in a discharge space into which gas composed mainly of oxygen gas has been fed. An alternating voltage is applied across the electrodes to cause dielectric barrier discharge (silent discharge or creeping discharge) in the discharge space, whereby ozone gas-containing oxygen gas is produced and, further, a metal or a metal compound is modified to a photocatalytic material by the above dielectric barrier discharge. |
