发明名称 |
Diazo development unit based on half-damp process - has roller dipping into developer and ribbed surfaces on regulator blade and roller to control development |
摘要 |
<p>Diazo development appts. uses a damp roller technique. The diazo material is developed in a development zone between the developer-carrying roller (5) and a pressure roller (4). The amount of developer carried by the roller (5) is determined by the ribbed pattern on the surface of the roller and the lattice pattern (at 15) on the regulator blade (12) which presses on the development roller (5) in advance of the development zone. The depths of ribs, lattice patterns and pressure of blades and rollers have specified measurements.</p> |
申请公布号 |
DE2821855(A1) |
申请公布日期 |
1979.11.22 |
申请号 |
DE19782821855 |
申请日期 |
1978.05.19 |
申请人 |
HOECHST AG |
发明人 |
SCHROETER,HERBERT,DIPL.-PHYS.DR. |
分类号 |
G03D5/06;(IPC1-7):03D5/06 |
主分类号 |
G03D5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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