发明名称 Diazo development unit based on half-damp process - has roller dipping into developer and ribbed surfaces on regulator blade and roller to control development
摘要 <p>Diazo development appts. uses a damp roller technique. The diazo material is developed in a development zone between the developer-carrying roller (5) and a pressure roller (4). The amount of developer carried by the roller (5) is determined by the ribbed pattern on the surface of the roller and the lattice pattern (at 15) on the regulator blade (12) which presses on the development roller (5) in advance of the development zone. The depths of ribs, lattice patterns and pressure of blades and rollers have specified measurements.</p>
申请公布号 DE2821855(A1) 申请公布日期 1979.11.22
申请号 DE19782821855 申请日期 1978.05.19
申请人 HOECHST AG 发明人 SCHROETER,HERBERT,DIPL.-PHYS.DR.
分类号 G03D5/06;(IPC1-7):03D5/06 主分类号 G03D5/06
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