| 摘要 |
<p>An apparatus and method for automatically replacing a photoresist container are provided to allow successive exposure process without stopping due to replacement of photoresist containers containing insufficient amount of photoresist, and prevent accidents that may occur during replacement of photoresist container, thereby facilitating application of photoresist on a semiconductor substrate. An apparatus for automatically replacing a photoresist container(102) comprises a stage unit(110), a driving unit(124), a container cap removing unit(150), a nozzle unit(160), a reading unit(170), and a control unit(104). The stage unit comprises a stage(112) and a weight meter(114) attached onto the stage for measuring a weight of photoresist containers(120a,120b) to be placed on the stage. The driving unit drives the stage to move the photoresist containers. The container cap removing unit, which is movable by the driving unit, is configured to open and close openings of the photoresist containers by removing a cap(122) of each container. The nozzle unit comprises a nozzle discharging a photoresist and moves the nozzle up and down. The reading unit is installed on one side of the stage to read out a name of photoresist attached on the photoresist containers. The control unit controls operation of the stage unit, driving, unit, container cap removing unit, nozzle unit, and reading unit.</p> |
