POLISHING PAD AND MANUFACTURING METHOD FOR THE POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad capable of polishing without reducing a polishing rate for many hours to obtain a high degree of flatness while preventing the occurrence of scratches.

SOLUTION: This polishing pad includes a fiber mutually twined-around body formed by a bundle 1 of fibers composed of extremely thin single fibers having average cross sectional area in a scope of 0.01-30 μm2and a polymer elastic body 2. A part of the polymer elastic body 2 exists in the inside of the bundle 1 of fibers and collects the extremely thin single fibers into the bundle. The number of bundles of fibers per unit area existent in cross section in the direction of thickness is 600 bundles/mm2or more, and a voluminal ratio of parts except a cavity is in a scope of 55-95%.

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