| 摘要 |
<P>PROBLEM TO BE SOLVED: To establish a method of enabling certain and accurate measurement of a flat shape without requiring a new dedicated measuring means. <P>SOLUTION: This flat mirror shape measuring method is applied to a device comprising a stage moving on the XY plane, a laser interferometer for measuring the position of this stage, the flat mirror fixed to the stage in order to reflect the laser radiated from the interferometer, and a scope capable of measuring the mark position on a wafer mounted on the stage. When the shape of the flat mirror is measured using the wafer where marks measurable with the scope are arranged at equal intervals in each of the X and Y directions while the XY stage is moved along the flat mirror to be measured, the positions of the marks on the wafer held by a wafer chuck are measured by the scope, and flat mirror shape measurement data by the laser interferometer is calibrated. <P>COPYRIGHT: (C)2008,JPO&INPIT |
