A manufacturing apparatus for a semiconductor is provided to connect a cleaning gas supply line to a plurality of reaction chambers from a remote plasma generator and supply cleaning gas to a plurality of reaction chambers successively in order to reduce the idle time of the standby state of the remote plasma generator. A source gas supply part(120) supplies source gas for a process of manufacturing a semiconductor to a plurality of reaction chambers(110). A washing gas supply part(150) supplies cleaning gas for washing a plurality of reaction chambers. A remote plasma generator(160) excites cleaning gas supplied from the washing gas supply part into a plasma state. A cleaning gas lines are serially connected from the washing gas supply part to the remote plasma generator. The cleaning gas lines(170) are branched from the backend of the remote plasma generator and are parallelly connected to a plurality of reaction chambers. A plurality of washing gas valves(180) control the flow of the cleaning gas supplied to a plurality of reaction chambers through cleaning gas lines.
