Method of making a negative exposure mask

摘要

A negative exposure mask is prepared by forming a positive mask image of a first metal layer on a transparent substrate and applying a layer of resist which is exposed through the back of the substrate and developed to form a lift-off mask. The lift-off mask is used to form a negative mask image of a second layer of metal on the substrate in the areas not covered by the first metal layer. The first metal layer is then etched away to leave the negative mask image on the substrate.