发明名称 |
Exposure meter for photomicrography |
摘要 |
Photomicrographic exposure meter for cameras attached to microscopes in which part of the picture-taking beam is reflected by means of a beam-splitter and where the reflected beam part projects an image of the object onto an image plane, measuring field stop is located in the image plane with an aperture for detail or spot measurements and an insertable photo-electric detector cooperates therewith downstream of the stop in the direction of light. The beam part is reflected by at least one specular means (12,61) to the measuring field stop (13). The stop is gimbal-suspended and means are provided both for displacing the gimbal-suspended specular means (12,61) and for viewing the object detail appearing in the stop aperture.
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申请公布号 |
US4174159(A) |
申请公布日期 |
1979.11.13 |
申请号 |
US19780895477 |
申请日期 |
1978.04.11 |
申请人 |
LEITZ, ERNST GMBH |
发明人 |
KRAFT, WINFRIED;LEITER, HERBERT;REINHEIMER, GUNTER |
分类号 |
G03B7/099;G02B21/00;G02B21/36;(IPC1-7):G02B21/00;G03B17/48;G03B7/08 |
主分类号 |
G03B7/099 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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