| 摘要 |
<p>A system and a method for compensating a focus of an exposure device, and an apparatus and a method for detecting a focus of the exposure device are provided to reduce a process time by detecting a vertical stat of an upper part of a stage with regard to an optical axis of a projection lens in real time. A focus matching pattern(501,502) is formed in the center of the left and right sides of an edge region of a reticle. A photo detection sensor(100) produces a waveform corresponding to light passing through the focus matching pattern and a projection lens(15). A signal amplifier(200) amplifies the waveform. A controller(300) controls the vertical state of the upper part of the stage based on the optical axis of a projection lens according to the tilt of the projection lens. An actuator(400) forms the vertical state of the upper side of the stage based on the optical axis of the projection lens according to the control of the controller.</p> |
