ELECTRON SENSITIVE RESIN CONTAINING A METALLIC METHACRYLATE SALT AND ITS APPLICATION IN ELECTRON-BEAM LITHOGRAPHY,申请号EP19790100621-传众专利搜索

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发明名称	ELECTRON SENSITIVE RESIN CONTAINING A METALLIC METHACRYLATE SALT AND ITS APPLICATION IN ELECTRON-BEAM LITHOGRAPHY
摘要
申请公布号	EP0004555(A3)	申请公布日期	1979.10.31
申请号	EP19790100621	申请日期	1979.03.02
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	HATZAKIS, MICHAEL;WEBB, DAVID JOHN
分类号	G03C5/08;C08F220/00;C08F220/04;C08F220/10;G03C1/72;G03F7/004;G03F7/039;G03F7/20;H01L21/027;(IPC1-7):G03C1/72;C08L33/10;G03F7/10	主分类号	G03C5/08
代理机构		代理人
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