| 摘要 |
A photosensitive material for electrophotography is provided, which comprises in sequence an aluminum substrate, a charge transport layer, a hole injection layer, a charge generation layer, and a surface protection layer, wherein the surface protection layer comprises an arsenic-selenium alloy containing from 35 atomic % to 45 atomic % arsenic. The photosensitive material may also include a buffer layer comprising an arsenic-selenium alloy disposed between the surface protection layer and the charge generation layer, said buffer layer having a graduated arsenic concentration in which the concentration of arsenic increases in the direction of the surface protection layer. These layers provide enhanced lifetime for the materials while maintaning good print quality. Further, the insertion of the buffer layer allows for high temperature operation.
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