METHOD OF MANUFACTURING METAL-CLAD SUBSTRATE, METAL-CLAD SUBSTRATE AND COMPOSITION FOR MANUFACTURING METAL-CLAD SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a metal-clad substrate, for producing a fine metal film having low resistance by a mist CVD method, and to provide a metal-clad substrate and a composition for manufacturing the metal-clad substrate.SOLUTION: The composition 11 for manufacturing a metal-clad substrate contains a salt of a metal and an amine compound, the metal being one or more metals selected from groups 10 and 11 in a periodic table. The method of manufacturing a metal-clad substrate has; a step (1) in which an apparatus 10 is used, and a substrate 9 is heated by placing it on a heating plate 8 in a film deposition chamber 4 under an inert gas atmosphere; and a step (2) in which a composition 11 for manufacturing the metal-clad substrate is sprayed onto the substrate 9 by using a spray unit 3.SELECTED DRAWING: Figure 1