发明名称 AUTOMATIC MEASUREMENT OF HIGH-PRECISION ETCHED STRUCTURES
摘要 For the purpose of automatically monitoring the production of etched structures in a sheet or film 1, apertures, preferably arranged to form a grid, are also etched in each film or sheet 1. An image of the grid is projected onto light-sensitive receiving elements 7. The signal produced is a measure of the transparent area of the grid from which the critical dimensions of the etched structures are then derived. The apparatus comprises a suction plate 2 to press sheet or film 1 against covering plate 3, so that the grid covers registering apertures in these plates. <IMAGE>
申请公布号 AU4583079(A) 申请公布日期 1979.10.18
申请号 AU19790045830 申请日期 1979.04.09
申请人 SIEMENS A.G. 发明人 WALTER GLASHAUSER;HANS-JURGEN MICHEL
分类号 G01B11/14;C23F1/00;C25F3/02;G01B11/28;G01N21/88 主分类号 G01B11/14
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