| 摘要 |
PURPOSE:To obtain a photomask blank having thin and uniform film thickness and satisfactory step coverage by providing a glass layer contg. a photosensitive metal on a light shielding film on a light transmissive substrate. CONSTITUTION:In the title photomask blank, a pattern forming glass layer contg. a photosensitive metal behaving similarly as a resist film is formed on a light shielding film. Accordingly, a selective exposure treatment can be executed without requiring a resist film additionally. Since the glass layer contg. a photosensitive metal is formed by a film-forming means such as sputtering, CVD, vapor deposition, etc., the control of the film thickness is easy unlike a resist film. Moreover, satisfactopy step coverage is attained even if there are protrusions or stages on the light shielding film. Since the glass layer contg. a photosensitive metal can be formed to a thinner thickness than resist film (for example, to <=1,000Angstrom film thickness), a photomask having increased resolution of a light shielding film pattern is obtd. |
