| 发明名称 |
METHOD OF FABRICATING POSITIVE RESIST IMAGE |
| 摘要 |
A high speed high contrast electron resist composition comprising a copolymer of polymethylmethacrylate/methacrylic acid having incorporated therein a metal selected from the group consisting of lead, barium, calcium and strontium is disclosed. The metal is present in the range of from about 0.001% to about 10% by weight of the copolymer. |
| 申请公布号 |
JPS54131935(A) |
申请公布日期 |
1979.10.13 |
| 申请号 |
JP19790019865 |
申请日期 |
1979.02.23 |
| 申请人 |
IBM |
发明人 |
MAIKURU HATSUZAKISU;DEEBITSUDO JIYON UEBU |
| 分类号 |
G03C5/08;C08F220/00;C08F220/04;C08F220/10;G03C1/72;G03F7/004;G03F7/039;G03F7/20;H01L21/027 |
主分类号 |
G03C5/08 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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