发明名称 HIGH POWER GAS LASER
摘要 <p>HIGH POWER GAS LASER A region is provided for maintaining a glow discharge in a flowing laser gas mixture. The gas laser apparatus includes an arc plasma source for providing a plasma gas stream which is rich in electrons and/or metastables. The plasma gas is other than the laser gas, and the plasma stream assists the glow discharge such that a non-arcing glow discharge can be established in the glow discharge region.</p>
申请公布号 CA1064151(A) 申请公布日期 1979.10.09
申请号 CA19760250378 申请日期 1976.04.15
申请人 RCA LIMITED 发明人 CRANE, ROBERT A.;GHOSH, ASOKE K.
分类号 H01S3/22;(IPC1-7):01S3/22 主分类号 H01S3/22
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