发明名称 MANUFACTURE FOR SEMICONDUCTOR DEVICE
摘要 PURPOSE:To perform soldering for the Si substrate with Mo or W plate, without causing the occurrence of nest and the deterioration in performance. CONSTITUTION:Al3 is evaporated on the Mo plate 2, forming the MoAl alloy 4 by keeping it at more than 650 deg.C under vacuum. Further, the Al3a is evaporated. The Al3a is coated on the Si substrate, the both are laminated opposingly with the Al3a, and it is processed at 630 deg.C under vacuum, then no nest is caused between the Si substrate 1 and the Mo plate 2, performance is not deteriorated, and excellent device can be obtained.
申请公布号 JPS54128676(A) 申请公布日期 1979.10.05
申请号 JP19780037182 申请日期 1978.03.29
申请人 发明人
分类号 H01L21/52;H01L21/58 主分类号 H01L21/52
代理机构 代理人
主权项
地址
您可能感兴趣的专利