发明名称 DEPOSITION SOURCE FOR ELECTRONIC BEAM DEPOSITION APPARATUS
摘要 PURPOSE:To make easier the removal operation of deposited material as well as enhance the power efficiency and deposition speed by providing detachably a cylind- rical part for controlling the evaporation direction of deposition material at the opening end or its neighboring position of the concavity of hearth filled with deposition material. CONSTITUTION:The liner crucible 32 is provided detachably in the inside of the concavity 12 of the hearth 10. When the electronic beam 22 is irradiated onto the deposition material 16 in the crucible 32 for heating, the fused portion 16A is formed in the greater part of the concavity but because the bottom of the concavity 12 is exposed to the air, the scull 16B is formed on the bottom by the water cooling action of the piping 18. However, the formation of scull is small on the bottom alone of the concavity, so that the power efficiency and the evaporation speed become greater. Also, because the position where the deposition material 30 is adhered is in the inside of the cylindrical part 32B of the crucible 32, the removal of the deposited material can be easily made simply by taking out and cleaning the crucible 32 at the time when a certain amount of deposited material 30 deposited.
申请公布号 JPS54127878(A) 申请公布日期 1979.10.04
申请号 JP19780035538 申请日期 1978.03.29
申请人 HITACHI LTD 发明人 NARUSHIMA MASACHIKA;TOMOSAWA AKIHIRO;NAGASAKI TAKAO;MURAMATSU KIMIO
分类号 C23C14/30 主分类号 C23C14/30
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