| 摘要 |
A light-reflection type pattern forming system used in the process for producing semiconductor devices. The system comprises a light source, a light-reflection type mask having a highly reflective region with a desired pattern on its surface, and an object to be exposed by the light reflected from said highly reflective region. The reflected light contains the information about the desired pattern and the desired pattern is copied on the object. Since this constitution uses reflected light instead of transmitted light, the absorption of light can be prevented and also the restriction on the range of wavelengths of the light from the source can be removed. The part of the incident light cast on the region other than the highly reflective region is absorbed, irregularly reflected or diverted so as not to expose the object. |
