DRYING DEVICE OF PHOTO RESIST FILM

摘要

PURPOSE:To ensure the drying of the photo resist with a uniform speed by providing the pressure-reduction waveguide having the open terminal onto the upper surfce of the plane-type heater part. CONSTITUTION:Upper surface 1a of heater part 1 incorporating a heater is flat and contains branch tube 2a and 2b opening. Wafer 3 coated with resist 4 is put on surface 1a, and the vacuum adsorption is given to hold a good plane. Thus, heating process is given. In such consitution, the resist drying is possible without causing any warp even for the wafer featuring a large diameter, thus securing the quick formation of the photo resist with a uniform thickness.