| 摘要 |
PURPOSE:To enable the pattern drawing with high accuracy with a simple constitution, by effectively compensating the revolution error toward deflection due to the magnetic field coil at the final stage with auxiliary lens. CONSTITUTION:The electron rays from the electron gun 1 are shaped via the blanking plate 2, apperture 3, and capacitor 4 and controlled for deflection toward specified direction via the X direction electrostatic deflection plate 5 and the Y direction electrostatic deflection plate 6. Further, the beam is radiated on the test piece 9 mounted on the table 8 via the magnetic field lens at the final stage and focus is formed here. With this constitution, on the upper location near the magnetic field lens 7, the auxiliary lens 11 in which hysteresis is entirely reduced than the lens 7 by taking ferrite core or no core, is newly provided. Further, the exciting current information of the lens 11 is processed for operation with the unit 14 via the interface 13, and the deflection plates 5 and 6 are controlled based on the result, compensating the revolution of the beam deflection angle caused in the lens 7. |
