发明名称 PROCESS FOR PRODUCING LARGE-SIZE SELF-SUPPORTING PLATES OF SILICON
摘要 Process for producing large-size, self-supporting plates of silicon deposited from the gaseous phase on a substrate body, which comprises heating a graphite substrate to deposition temperature of silicon, which is deposited on the substrate from a gaseous compound to which a dopant has been added until a layer of about 200 to 650 .mu.m has formed, subsequently melting 40-100% of this layer from the free surface downward, resolidifying the molten silicon by adjustment of a temperature gradient from the substrate body upward, and finally separating the silicon therefrom. The plates so formed are used primarily for making solar cells.
申请公布号 CA1062130(A) 申请公布日期 1979.09.11
申请号 CA19760266985 申请日期 1976.12.02
申请人 WACKER-CHEMITRONIC GESELLSCHAFT FUER ELEKTRONIK-GRUNDSTOFFE M.B.H 发明人 AUTHIER, BERNHARD;GRIESSHAMMER, RUDOLF;KOEPPL, FRANZ;LANG, WINFRIED;SIRTL, ERHARD;RATH, HEINZ-JOERG
分类号 C01B33/02;C01B33/027;C23C16/01;C23C16/24;C30B13/00;C30B13/06;C30B25/02;C30B29/06;H01L21/205;H01L21/208;H01L31/04 主分类号 C01B33/02
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