| 摘要 |
{PG,1 An attractive high-throughput technique for writing microcircuit patterns with a scanning electron spot of variable size is described in application Ser. No. 855,608, filed Nov. 29, 1977. In such an electron beam exposure system, two spaced-apart apertured mask plates with a deflector therebetween are included in the electron column of the system. As described herein, a third apertured mask plate and an associated deflector are serially added to the aforenoted components in the column. In this way, the throughput and other performance characteristics of such a system are significantly enhanced.
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