发明名称 APPARATUS FOR DOPING A SEMICONDUCTOR CRYSTALLINE ROD
摘要 <p>A device is described for the deliberate introduction of doping material radiogenically into a semiconductor crystalline rod, in which a connection to a radiation source is provided in an irradiation chamber with a rod holder arranged therein. The doping of the semiconductor rod is effected via controlled axial movements of the rod in relation to the radiation source.</p>
申请公布号 CA1061686(A) 申请公布日期 1979.09.04
申请号 CA19750233057 申请日期 1975.08.07
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 MARTIN, JOACHIM;HAAS, ERNST;SCHNOELLER, MANFRED
分类号 C30B31/20;G21G1/06;G21K1/00;G21K5/08;H01L21/261;(IPC1-7):01J17/34 主分类号 C30B31/20
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