| 摘要 |
In general, materials having the structure <IMAGE> WHEREIN N EQUALS 1 OR 2; A represents phenylene, naphthylene, anthracenyl, anthracenediyl, and dibenzothien-diyl; R1 and R2, which may be the same or different when taken alone represent hydrogen, cyano, alkylcarbonyl and arylcarbamoyl, arylcarbonyl, cyanoaryl; R1 and R2, when taken together, represent sufficient atoms to form substituted and unsubstituted radicals selected from the group consisting of furanylidene, fluorenylidene, pyrimidinylidene, thiazolidinylidene, pyrrolinyl, and indenyl, isoxazolinylidene, pyrazolinylidene and indanylidene, wherein said substituents are selected from the group consisting of hydrogen, cyano, aryl, oxo, thioxo, nitro, alkyl, nitroaryl, carbamoyl and cyanoalkyl; and ALKYL REPRESENTS AN ALKYL GROUP HAVING FROM ONE TO SIX CARBON ATOMS; ARYL REPRESENTS AN AROMATIC NUCLEUS SELECTED FROM THE GROUP CONSISTING OF BENZENE, NAPHTHALENE OR ANTHRACENE, ARE USEFUL IN ELECTROPHORETIC MIGRATION IMAGING PROCESSES.
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