Phenol-free and chlorinated hydrocarbon-free photoresist stripper comprising surfactant and hydrotropic aromatic sulfonic acids

摘要

Stripping solutions, free from phenol and chlorinated hydrocarbon compounds, comprising a surfactant alkylarylsulfonic acid having 12-20 carbons, a hydrotropic aromatic sulfonic acid having 6-9 carbons and a halogen-free aromatic hydrocarbon solvent with a boiling point above 150 DEG C. The stripping compositions effectively remove organic polymeric substances from inorganic substrates and are substantially clear water rinsable.