| 摘要 |
PURPOSE:To selectively remove glass particles, by washing the glass with surface active agent after attaching the glass with electrodeposition. CONSTITUTION:The thermal oxidation film 2 on the Si substrate 1 is photo-etched, and the glass 3 is selectively made electrode-position. Next, cleaning is made by using water solution or solution of surface active agent, and the glass particles 4 on the film 2 are removed and dried. Thus, only the particles 4 on the film 4 can be removed and the deficiency of photoetching after the formation of glass film can be reduced. |
