| 摘要 |
PURPOSE:A sputtering apparatus is constructed so that high frequency is applied to a sputter source consisting of coil to sputter it, and the sputtered material covers an opposingly disposed object, forming uniform, well-adhered, high quality coating layer. CONSTITUTION:A sputter source consists of a plural turn coil in which cooling water flows. A object 2 to be coated is placed inside the coil 7. High frequency 6, high voltage is applied across the object 2 and the negative coil 7 to cause cathode glow near the negative coil 7. Excited gas particles are ionized, and the ionized particles collide with the coil 7 surface to sputter the coil material, splashing them to coat onto the object surface 2. The process is particularly useful for coating elongated object. |
