发明名称 |
METHOD OF AND DEVICE FOR ALIGNING PHOTO MASK |
摘要 |
An automatic photomask alignment system includes a monochromatic light source, such as a laser, a series of diffraction patterns which are located on a semiconductor substrate and keys which are located on photomasks with which the substrate is to be aligned. A light beam is directed through the key on a photomask onto the diffraction pattern to provide a pattern of light spots whose intensities at various locations are determined by the relative alignment of the mask and the diffraction grating. A feedback arrangement which employs photocells and means for moving the photomasks relative to the substrate provides the alignment of the photomasks with the substrate. |
申请公布号 |
JPS54101676(A) |
申请公布日期 |
1979.08.10 |
申请号 |
JP19790001789 |
申请日期 |
1979.01.13 |
申请人 |
RCA CORP |
发明人 |
HANSU PIITAA KURAINNATSUHA;URUFURAMU AANARUFU BUUZENBERUG |
分类号 |
H01L21/30;G03F9/00;H01L21/027;H01L21/67;H01L21/68 |
主分类号 |
H01L21/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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