| 摘要 |
PURPOSE:To smooth the base of guide grooves and to uniformize the depth of the plural guide grooves by forming patterns consisting of a resin on one main surface of a transparent substrate and forming thin films contg. at least either of a silicon oxide and metal oxide so as to cover the patterns. CONSTITUTION:A photosensitive resin film 3 is formed on one main surface of the light transparent substrate 2 having a through-hole 1 in the central part, then this photosensitive resin film 3 is selectively exposed to form latent images 3l on the film 3. The film 3 formed with the latent images 3l is subjected to a development processing to form the patterns 3p consisting of the resin. Further, the thin films 6 contg. at least either of the silicon oxide and the metal oxide are so formed as to convert the patterns 3p in accordance with the shapes of the patterns 3p. The thin films 6 have projecting thin film pattern parts 6b corresponding to the resist patterns 3p and the guide grooves 7 are formed between the thin film pattern parts 6p and 6p. The base of the guide grooves is smoothed in this way and the depth of the plural guide grooves is uniformized. |
