| 摘要 |
PURPOSE:To quickly examine fine foreign matter and any fault on and in a reticle under a conditions more similar to an actual photography process by directly transferring a reticle pattern on a photoresist film or a CEL film for its inspection. CONSTITUTION:A photoresist film 2 involving an absorbent is formed on a surface of a quartz glass plate 1 by a coating process, the absorbent absorving 90% or more of a light having 500nm or longer wavelengths. The photoresist film 2 is exposed to the light and patterned with a reticle 3 to be inspected as a mask to transfer a pattern 4 of the reticle 3. The quartz glass plate 1 so processed is set in a transmission type mask inspection device having a light source from which 500nm or shorter wavelengths have been removed using a filter, for inspecting any pattern fault. Hereby, fine foreign matter and any fault existent on and in a reticle can quickly be inspected in a condition which more resembles an actual photography process. |
