发明名称 Field effect transistor
摘要 A field effect transistor having a doping concentration profile selected to linearize the relationship between the transconductance of the transistor and the level of a gate voltage fed to the gate electrode of such transistor over the operating range of such voltage. A first doping concentration profile is "spike-shaped" so that the bottom of the depletion zone and hence the transconductance is substantially invariant with gate voltage level. A second doping concentration profile, N(x), varies substantially as 1/x3 (where x is the depth from the surface of the transistor) over the operating range of the bottom of the depletion zone.
申请公布号 US4163984(A) 申请公布日期 1979.08.07
申请号 US19780873189 申请日期 1978.01.27
申请人 RAYTHEON 发明人 PUCEL, ROBERT A
分类号 H01L29/10;H01L29/812;(IPC1-7):H01L29/80 主分类号 H01L29/10
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