发明名称 SEMICONDUCTOR DEVIE AND ITS PRODUCTION
摘要 PURPOSE:To prevent irregular cracks from being generated in a glass film when a semiconductor substrate is divided into pellets, by forming the glass film only in sorrounding parts except a part of the main surface of the semiconductor substrate. CONSTITUTION:Grid-shaped mesa groove 2 is formed on one main surface, at least, of semiconductor substrate 1 having two main surfaces by etching. Next, glass film 3 is formed on mesa groove 2 except part 11 in intersecting part 10 of mesa groove 2. Next, grid-shaped cut 5 is provided along mesa groove 2, and substrate 1 is divided into pellets 6 along this cut 5. As a result, since corner parts of pellet 6 are not covered with galss film 3, glass film 3 is prevented from cracking complicatedly in corner parts of pellet 6 where a complicated force is applied, so that glass film 3 can be prevented from protruding.
申请公布号 JPS5493968(A) 申请公布日期 1979.07.25
申请号 JP19780000756 申请日期 1978.01.06
申请人 发明人
分类号 H01L23/29;H01L21/316;H01L21/56;H01L23/31 主分类号 H01L23/29
代理机构 代理人
主权项
地址