发明名称 MANUFACTURE OF SEMICONDUCTOR DEVICE
摘要 PURPOSE:To attain relative positioning efficiently by providing circular patterns different in diameter for positioning to a mask. CONSTITUTION:In addition to the 1st layer pattern 31, the 2nd to 5th layer mask patterns 32 to 35 are used which are concentric and different in diameter. As a result, a shift in position can be found through entire sense and recognized quickly by an operator, and reduction in pattern area against variations of diameters (r1) to (r5) becomes smallest; and pattern precision is high, and a ratio of the pattern effective area is also high.
申请公布号 JPS5491058(A) 申请公布日期 1979.07.19
申请号 JP19770157940 申请日期 1977.12.28
申请人 NIPPON ELECTRIC CO 发明人 WADA TOSHIO
分类号 H01L21/027;H01L21/302 主分类号 H01L21/027
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