发明名称 PATTERN INSPECTION SYSTEM THROUGH INFLECTIONNPOINT COMPARISON
摘要 PURPOSE:To detect accurately a fine defect witout limiting an inspected pattern on a pattern inspection system for an integrated circuit, printed substrate, etc., by discriminating the defect by comparing the inflection point of a pattern less than the constant radius of curvature extracted with dictionary data. CONSTITUTION:Pattern materials 1 are picture-taken by TV camera 2 and photoelectrically converted by photoelectric detectors 7 and 8 into pattern binary signal 9, which are cut into fine stripes as they are by pattern segmentation 10, and inversion signals from 1.0-inversion 12 are cut into fine stripes by pattern segmentation 13. Those segmentated signals are applied to pattern expanders 11 and 14 for reloading and the both are compared to obtain a quantization error, which is compressed by quantization error compression 16 and applied to inflection-point detector 17, thereby detecting a pattern inflection point less than the constant radius of curvature. This detected inflection point is compared with a value as dictionary data, when the inflection point below radius (r) of curvature from plot data 18 is extracted, through comparison 20, thereby detecting the defect of a curve point.
申请公布号 JPS5491025(A) 申请公布日期 1979.07.19
申请号 JP19770158744 申请日期 1977.12.28
申请人 FUJITSU LTD 发明人 NAKASHIMA MASAHITO;FUJIWARA KATSUMI;GOTOU YOSHIAKI
分类号 G06T1/00;G06K9/00;G06T3/00;G06T7/60 主分类号 G06T1/00
代理机构 代理人
主权项
地址