| 摘要 |
PURPOSE:To prevent the relative positional slippage between patterns on the surface and the reverse face by fixing a substrate, where a pattern is formed on the reverse face, onto a transparent glass plate larger than the substrate and forming a pattern on the surface while observing the pattern on the reverse face. CONSTITUTION:Prescribed pattern 2 is formed on the reverse face of semiconductor subsrtrate 1, and photo resistor 4 is used to fix substrate 1 on transparent glass plate 3, which is vertically and horizontally larger than substrate 1, so that pattern 2 may be facedown. Next, photo resistor 5 is applied throughout the surface of glass plate 3 including substrate 1 and is developed by light exposure, thereby forming surface pattern 6. At this time, a two-sided mask positioning unit is used for mask positioning, and positioning is performed while observing relatively patterns 2 and 3 optically on a basis of reverseface pattern 2. Thus, the relative positional relation between two-sided patterns can be inspected very simply and non-destructively. |
