发明名称 LIQUIDDPHASE EPITAXIAL GROWTH UNIT
摘要 <p>PURPOSE:To prevent the wear of a sliding face to obtain a good-crystal property epitaxial grown layer by fitting a wear-proof quartz plate into a part of the sliding face in graphite which constitutes a liquid-phase epitaxial device. CONSTITUTION:A liquid-phase epitaxial device is constituted by fixing stand 10 consisting of graphite of high purity and moving part 20 which slides on stand 10. Moving part 20 generates rooms 31 to 33 segmented on fixing stand 10 together with partition plates 21 and 22, and material of each layer which will be grown is charged in the room. In this constitution, quartz plates 71 and 73 as well as 72 and 74 are fitted oppositely in the sliding face between fixing stang 10 and moving part 20. Thus, when sliding is performed on the face of quartz plates, graphite powder is prevented from being generated, and bad influences of a grown layer are prevented. Further, when the sliding face is inclined to provide quartz plates here, the horizontal slippage at a sliding time is prevented.</p>
申请公布号 JPS5488069(A) 申请公布日期 1979.07.12
申请号 JP19770156771 申请日期 1977.12.26
申请人 FUJITSU LTD 发明人 SEKI KATSUJI;IMAI HAJIME
分类号 C30B19/06;H01L21/208;H01L33/30 主分类号 C30B19/06
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