发明名称 Elektrolytisches Abscheideverfahren zur Herstellung von grossflaechigen Halbleiterbauelementen
摘要 A method of producing large area semiconductor components of binary compounds by electrolytic deposition comprises carrying out deposition using metallic layers as electrodes and with the two components of the compound present in the electrolyte, one of the two components being reduced cathodically at one of the electrodes and being adsorbed thereby and the second component reacting with the cathodically reduced component to form the binary compound.
申请公布号 DE2810605(B1) 申请公布日期 1979.07.12
申请号 DE19782810605 申请日期 1978.03.11
申请人 LICENTIA PATENT-VERWALTUNGS-GMBH, 6000 FRANKFURT 发明人 BOEHM, HARALD, DR.PHIL.NAT., 6241 GLASHUETTEN;FLEISCHMANN, ROBERT, DR.RER.NAT., 8752 HOESBACH
分类号 H01L31/04;C30B7/12;H01L21/208;H01L21/331;H01L21/368;H01L21/388;H01L29/73;H01L31/18;H01L31/20;(IPC1-7):H01L21/208;C25B1/00 主分类号 H01L31/04
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