| 摘要 |
PURPOSE:To prevent cracking and to obtain a uniform multi-layered resist pattern of high quality by setting the heating temperature of a resist film for flattening above the heating temperature of an SOG film. CONSTITUTION:A desired substrate 11 is coated with the resist 12 for flattening and a heat treatment is carried out. This heating temperature is higher than the heating temperature of a next SOG film 13. The SOG film is coated with resist 14 containing a photosensitive material to form a multi-layered resist film. This constitution eliminate unwanted cracking in the SOG film 13 to form the uniform multi-layered resist pattern of high quality. |
