| 摘要 |
i) exhaustion gas path (25); ii) injection part (26) inducing growth solution (37,38) to a crystal substrate; iii) an enclosed material (21) having an outlet (27) to eliminate the growth solution after reaction; iv) a rotatory material (22) which passes through the (21) in which a substrate setting tool (30), growth solution injection path (31), and outlet (28) are included; v) solution bath (32); and vi) waste solution bath (36).
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