发明名称 EXPOSURE APPARATUS
摘要 PURPOSE:To shield photo resist from air and make possible exposure without using any high vacuum vessel or the like by rotating a video desc being a recording medium and flowing an inert gas from the center thereof toward the outside circumference thereby forming the film of the inert gas on the surface. CONSTITUTION:The inert gas 110, having been removed of dust by being passed through a filter 12, is sent to the surface of the photo resist 4 on a disc 1 from a suction port 9 through gas pipe. When a motor 6 is run in this state, the surface inert gas laminar flow having a flowline 111 produces on the surface of the rotary disc 1. Since the disc 1 and back plate 10 are in proximity, the inert gas existing therebetween is forced out in the radial direction by centrifugal force, whereby the laminar flow of the inert gas 110 is continuously formed on the surface of the photo resist 4. The photo resist 4 is then shielded from air by the film of the inert gas 110. At this time, production of turbulence is prevented by the exhaust port 14 provided to part of the housing structure. The photo resist 4 is then sensitized by light 5 for resist exposure.
申请公布号 JPS5469404(A) 申请公布日期 1979.06.04
申请号 JP19770137071 申请日期 1977.11.14
申请人 MITSUBISHI ELECTRIC CORP 发明人 NAKAGAWA KUNIHIKO
分类号 G03F7/20;G11B7/26 主分类号 G03F7/20
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