| 摘要 |
The discharge appliance (12) is mainly designed for cathode sputtering. It is located in a vessel (10) and contains, e.g., a hollow cylindrical cathode (14) and an anode (16). Magnet coils (20, 21) in the interior of the cathode and on the perimeter of the vessel together generate a magnetic field of at most 300 gauss at the perimeter of the cathode. The magnetic field, together with the electric field generated by the electrode arrangement (14, 16) produces a containment zone, bounded by cathode flanges (14a, 14b), for all those electrodes emitted by the electrode arrangement, whose energy is sufficient to ionise the working gas. The working gas has an operating pressure of at most 10<-2> torr. The sputtered cathode material is collected on a supporting flange (31). This method makes it possible to achieve relatively high deposition surfaces and improved layer qualities. The collection surface can be at a large distance from the plasma constrained to the volume close to the cathode and is thus not heated as strongly. Nevertheless, the deposited particles move in straight lines. The operating voltage can be low, e.g. less than 1,000 volts, which facilitates ionisation. <IMAGE>
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