发明名称 Monocrystal alignment and securing equipment suspends in mounting above base aligned with chamber support axis
摘要 <p>The equipment aligns and secures a monocrystal in a desired crystal direction by means of an X-ray emerging parallel to the lengthwise axis of a chamber support from the radiation unit. The equipment, with an adjustable mounting for the crystal, slides onto the support. During adjustment the crystal (5) is suspended in the mounting (13) above a base (27) aligned with the lengthwise axis of the support, and it is glued to this base after adjustment and bringing the two together. The base can be of easily machined ceramic material such as Ergan.</p>
申请公布号 DE2752925(A1) 申请公布日期 1979.05.31
申请号 DE19772752925 申请日期 1977.11.26
申请人 PHILIPS PATENTVERWALTUNG GMBH 发明人 OBERTROP,DIETER;HEINE,ROLF
分类号 B28D5/00;(IPC1-7):B28D7/00 主分类号 B28D5/00
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