| 摘要 |
PURPOSE:To enhance sensitivity, as well as heat resistance, contrast, resolution, etc., by using a specified copolymer for a positive tye resist material for use in ionizing raidation and ultraviolet lithography. CONSTITUTION:As functional monomers participating in cross-linking reaction, 2-20 mole % of methacrylamide and 0.4-20 mole % of methacryloyl chloride are selected and they are copolymerized with 70-97 mole %. This copolymer is dissolved in a solvent and coated on a substrate. Subsequent heating causes dehydrochlorination, imide type cross-linking, formation of 3-dimensional network structure, and insolubilization in solvents. Then, patterns are formed by irradiating ionizing radiation, and the part of patterns are dissolved selectively in a developing solvent. |
