发明名称 Semiconductor memory
摘要 A semiconductor memory has at least one V-MOS transistor which includes a trench and a storage capacitor. A semiconductor substrate is doped with concentration centers of a first conductivity type and has a buried layer which is doped with concentration centers of a second conductivity type opposite to the first conductivity type. At least two additional layers are divided by the trench and have alternately differing conductivity types, the two additional layers and the buried layer being produced by diffusion and/or implantation.
申请公布号 US4156289(A) 申请公布日期 1979.05.22
申请号 US19780872443 申请日期 1978.01.26
申请人 SIEMENS AG 发明人 HOFFMANN, KURT;MITTERER, RUDOLF
分类号 H01L27/10;G11C11/404;H01L21/8242;H01L27/108;H01L29/423;H01L29/78;(IPC1-7):G11C11/40 主分类号 H01L27/10
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