| 摘要 |
PURPOSE:To control exactly the positional relation of intermediate negatives on the produced mask for IC independently of production conditions by providing check patterns, where respective error values can be obtained in respect to error causes, on individual intermediate negatives. CONSTITUTION:In an intermediate negative (mask for IC), check patterns 23 are provided on split line 21 and split chip 22. Three pairs of patterns 23 are provided to form two opaque parts and one transparent part in respect to two orthogonal directions. In this constitution, since respective error values for individual error causes such as rotation and position slippage can be obtained from patterns 23, the positional relation between intermediate negative can be controlled exactly without influences of the porduction conditions even if check patterns are formed under different production conditions. |
