发明名称 METHOD OF ETCHING APERTURES IN A THIN METAL FOIL
摘要 <p>A method of etching apertures in a thin metal foil. The foil is first covered on both sides with etchant-resistant layers which have the desired pattern of apertures. One of the said layers is covered with a continuous protective layer. First, the side not covered with a protective layer is etched. The protective layer is then removed by means of a solvent, and then the other side is etched. According to the invention, the protective layer consists of a waxy hydrocarbon and the solvent consists of perchloroethylene.</p>
申请公布号 CA1054905(A) 申请公布日期 1979.05.22
申请号 CA19760243150 申请日期 1976.01.08
申请人 N.V. PHILIPS'GLOEILAMPENFABRIEKEN 发明人 TEN BLOEMENDAL, FRANS V.W.
分类号 C23F1/00;C23F1/02;H01J9/14;(IPC1-7):09K13/00 主分类号 C23F1/00
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