发明名称 |
METHOD OF ETCHING APERTURES IN A THIN METAL FOIL |
摘要 |
<p>A method of etching apertures in a thin metal foil. The foil is first covered on both sides with etchant-resistant layers which have the desired pattern of apertures. One of the said layers is covered with a continuous protective layer. First, the side not covered with a protective layer is etched. The protective layer is then removed by means of a solvent, and then the other side is etched. According to the invention, the protective layer consists of a waxy hydrocarbon and the solvent consists of perchloroethylene.</p> |
申请公布号 |
CA1054905(A) |
申请公布日期 |
1979.05.22 |
申请号 |
CA19760243150 |
申请日期 |
1976.01.08 |
申请人 |
N.V. PHILIPS'GLOEILAMPENFABRIEKEN |
发明人 |
TEN BLOEMENDAL, FRANS V.W. |
分类号 |
C23F1/00;C23F1/02;H01J9/14;(IPC1-7):09K13/00 |
主分类号 |
C23F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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