发明名称 CONTINUOUSLY ELECTROLYTIC ETCHING METHOD AND APPARATUS
摘要 PURPOSE:To continuously and uniformly etch only one side of each product of Al material or the like by introducing the products each detachably supported by a cassette into a cell in succession and supplying electric current while passing the cassette so that the product faces to the cathode. CONSTITUTION:Anode plate 11 and cathode plate 12 are placed face to face in cell 10. Products A each supported by cassette 20 are introduced into cess 10 from guide rail 13, and electric current is supplied between the plates while passing the cassete so that product A faces to plate 12, whereby only one side of product A facing to plate 12 is etched. At this time, cassette 30 provided with plate 11 is move in cell 10 to constantly supply fresh electrode. After the etching, cassette 20 is pushed out from the other end of guide rail 13 and stopper 26 is moved backward to detach product A.
申请公布号 JPS5462935(A) 申请公布日期 1979.05.21
申请号 JP19770130037 申请日期 1977.10.28
申请人 SUMITOMO ELECTRIC INDUSTRIES 发明人 TAMURA KENICHI;KOTANI YASUTOYO;NAGAI SHIYUUZOU
分类号 B23H9/00;B23H9/06;C25F3/04;C25F7/00 主分类号 B23H9/00
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