发明名称 PLASMA DISPOSAL UNIT
摘要 PURPOSE:To prevent the movement of disposed material, by placing a tool removable on the suceptor and by providing holes having slightly greater shape than the disposed material. CONSTITUTION:In the concave 17 on the suceptor 13, the tool 18 in matching with the wafer to be disposed is put, and after that, wafers are put in the hole 19 of the tool 18 and the wafers are placed on the suceptor 13, performing the wafer disposal. Accordingly, the movement of wafer can be avoided, uiform disposal can be made, and one plasma disposal unit can make for various sized wafers.
申请公布号 JPS5461474(A) 申请公布日期 1979.05.17
申请号 JP19770127513 申请日期 1977.10.26
申请人 HITACHI LTD 发明人 ARAOKA MANABU
分类号 C30B25/02;B01J19/08;H01L21/302;H01L21/3065 主分类号 C30B25/02
代理机构 代理人
主权项
地址